Zoltán Czigler has today filed a new PCT Patent Application as follows:
Filing Date: 15 November 2022
PCT Application Number: PCT/EP2022/081950
Priority Date: 23 March 2022
Method of forming a composite substrate
A method of forming a composite substrate is provided. The method includes a mixed gas plasma activation process using oxygen and nitrogen including exposing a surface of a wafer and a surface of a piezoelectric material wafer in a plasma system exposing the plasma activated surface of the wafer and the plasma activated surface of the piezoelectric material wafer to an ultraviolet radiation in an atmosphere of oxygen and nitrogen placing the surface of the wafer on the surface of the piezoelectric material wafer applying a mechanical load on the wafer and the piezoelectric material wafer and thermally annealing the bonded wafer and piezoelectric material wafer wherein the wafer is configured to support the piezoelectric material wafer.
